专利名称:METHOD OF MANUFACTURING SOLID-STATE IMAGING DEVICE, SOLID-STATEIMAGING DEVICE, AND ELECTRONICAPPARATUS
发明人:Tomomi Ito,Ryoji Suzuki,Taichi Natori申请号:US13238013申请日:20110921
公开号:US20120075509A1公开日:20120329
专利附图:
摘要:Provided is a method of manufacturing a solid-state imaging device including:
forming a first pattern having an independent island shape configured by an optical filtermaterial on some of photoelectric conversion units among a plurality of photoelectricconversion units arranged on the surface of a substrate; forming a mixed color
prevention layer on a side wall of the first pattern; and forming a second pattern havingan independent island shape configured by an optical filter material on the rest of thephotoelectric conversion units among the plurality of photoelectric conversion unitswhile the mixed color prevention layer is closely disposed between the first pattern andthe second pattern.
申请人:Tomomi Ito,Ryoji Suzuki,Taichi Natori
地址:Kanagawa JP,Kanagawa JP,Kanagawa JP
国籍:JP,JP,JP
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