专利名称:FILM FORMING METHOD AND
ELECTROOPTIC APPARATUS
发明人:Katsumi SUZUKI申请号:US12212040申请日:20080917
公开号:US20090110868A1公开日:20090430
专利附图:
摘要:A method for forming a film by applying a material liquid to an application areaof a base material and drying the applied material liquid includes: (a) forming a frame-shaped partition in the application area, the partition having a side surface facing a center
of the application area; (b) applying the material liquid to the application area; and (c)drying the material liquid. In step (a), the partition is formed so that the side surface ofthe partition is closer to the center than an outer edge of the application area and sothat a height of the partition is smaller than a film thickness of the material liquid at atime when the material liquid is applied and is larger than a thickness of the dried film.
申请人:Katsumi SUZUKI
地址:Suwa JP
国籍:JP
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