GAS-BARRIER MATERIAL AND PROCESS FOR PRODUCING THE

专利名称：GAS-BARRIER MATERIAL AND PROCESS FOR

PRODUCING THE SAME

发明人：Endo, Aki c/o Toyo Seikan Group Corporate

R & D,Sasaki, Hiroshi Toyo Seikan GroupCorporate R & D,Obu, Yusuke c/o ToyoSeikan Group Corporate R & D

申请号：EP06731227.2申请日：20060330公开号：EP1865020A1公开日：20071212

专利附图：

摘要：A gas-barrier material in which carboxyl groups are ionically crosslinked in anamount corresponding to an acid value of at least 330 mgKOH/g of a resin that has thecarboxyl groups in an amount corresponding to an acid value of not smaller than 580mgKOH/g. The gas-barrier material exhibits excellent gas-barrier property, retortresistance and flexibility under highly humid conditions, enables the film to be cured at alow temperature in a short period of time, and can be favorably produced.

申请人：TOYO SEIKAN KAISHA, LTD.

地址：3-1, Uchisaiwai-cho 1-chome Chiyoda-ku Tokyo 100-8522 JP

国籍：JP

代理机构：Manley, Nicholas Michael

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