专利名称：PROGRAMMABLE MASKING APPARATUS发明人：HECTOR FRANCO申请号：AU7166291申请日：19901212公开号：AU7166291A公开日：19910724
摘要：An electronically programmable masking device (162) for photolithographyapplications, comprising an active liquid crystal micro array of programmable pixels (101),an interconnection system (138) and, in most embodiments, the drive and interfacecircuitry. The programmable pixels (101) can be electronically controlled to be opaque ortransparent to the exposure light used in photolithographic exposure systems. The pixel(124) size must be such that when the pixel (124) is imaged on the target surface, theresulting size is compatible with the pattern resolution required on the target surface.The space between pixels (124), referred to as the pixel gap (106), must be of a size suchthat it cannot be resolved by the optics (162, 166) of the exposure system. A
communications link provides for direct downloading of patterning data to the devicefrom external sources such as computer aided design (CAD) systems.
申请人：MANUFACTURING SCIENCES, INC.
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