MEMS STRUCTURE AND MANUFACTURING METHOD THEREOF

专利名称：MEMS STRUCTURE AND MANUFACTURING

METHOD THEREOF

发明人：Hirofumi FUNABASHI,Yutaka

NONOMURA,Yoshiyuki HATA,MotohiroFUJIYOSHI,Teruhisa AKASHI,YoshiteruOMURA

申请号：US13035186申请日：20110225

公开号：US201102128A1公开日：20110908

专利附图：

摘要：In a MEMS structure, a first trench which penetrates the first layer, the secondlayer and the third layer is formed, and a second trench which penetrates the fifth layer,the forth layer and the third layer is formed. The first trench forms a first part of anoutline of the movable portion in a view along the stacked direction. The second trenchforms a second part of the outline of the movable portion in the view along the stackeddirection. At least a part of the first trench overlaps with the first extending portion in theview along the stacked direction.

申请人：Hirofumi FUNABASHI,Yutaka NONOMURA,Yoshiyuki HATA,MotohiroFUJIYOSHI,Teruhisa AKASHI,Yoshiteru OMURA

地址：Nagoya-shi JP,Nagoya-shi JP,Aichi-gun JP,Seto-shi JP,Nagoya-shi JP,Seto-shi JP

国籍：JP,JP,JP,JP,JP,JP

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