Method, Program Product and Apparatus for Predicti

专利名称：Method, Program Product and Apparatus

for Predicting Line Width Roughness andResist Pattern Failure and the Use Thereof ina Lithography Simulation Process

发明人：Steve Hansen申请号：US13244191申请日：20110923

公开号：US20120109607A1公开日：20120503

专利附图：

摘要：A method of generating a model for simulating the imaging performance of an

optical imaging system. The method includes the steps of defining the optical imagingsystem and a process to be utilized by the optical imaging system; defining a first modelrepresenting the imaging performance of the optical imaging system and the process,and calibrating the model, where the first model generates values corresponding to alatent image slope. The method further includes the step of defining a second model forestimating a line width roughness of a feature to be imaged, where the second modelutilizes the latent image slope values to estimate the line width roughness.

申请人：Steve Hansen

地址：Phoenix AZ US

国籍：US

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