Alignment method, alignment apparatus, and exposur

专利名称：Alignment method, alignment apparatus,

and exposure apparatus

发明人：Takamitsu Iwamoto申请号：US13339118申请日：20111228公开号：US09069266B2公开日：20150630

专利附图：

摘要：In the present invention, the number of brightness changes detected at thesame position while a substrate moves by a certain distance is added up, a plurality ofedge count data arranged corresponding to the detected positions of the brightness

changes is obtained, a plurality of correlation value data by performing a correlationoperation for the plurality of calculated edge count data while moving a template isobtained, positions of the plurality of patterns based on a plurality of correlation valuedata exceeding a predetermined threshold value are identified, a position of a patternclose to a target position of an imaging device is selected, and a photomask is moved inthe direction substantially orthogonal to the conveying direction of the substrate so thatthe amount of the position displacement between the selected position of the patternand the target position of the imaging device is a predetermined value.

申请人：Takamitsu Iwamoto

地址：Yokohama JP

国籍：JP

代理机构：Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.

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