Method of calibrating the optical system of a lase

专利名称：Method of calibrating the optical system of

a laser machine for processing electricalcircuit substrates

发明人：Alexander Kilthau,Andre Kletti,Hans Juergen

Mayer,Eddy Roelants

申请号：US10121731申请日：20020415公开号：US06678061B2公开日：20040113

专利附图：

摘要：To calibrate the optical system of a laser machine having a laser source, a

deflecting unit and an imaging unit, firstly a first sample plate is arranged in the focalplane of the imaging unit, with prescribed grid points being marked by the laser beam.After that, the marked points are measured by means of a camera, and their positionvalues are compared with the prescribed position values of the target points, in order toderive first correction values from this and store them. After that, a second sample plateis arranged in a second calibrating plane, at a distance from the focal plane, and istargeted by the laser beam and provided with markings. The second sample plate ismeasured by the camera, and the measured positions of the markings are compared withthe positions of the target points, in order to derive second correction values and storethem. From the stored first and second correction values of the two planes, correctionvalues can then be determined by interpolation for arbitrary target points in the spatialregion between the focal plane and the second calibrating plane and be used for theactivation of the deflecting unit.

申请人：SIEMENS AKTIENGESELLSCHAFT

代理机构：Harness, Dickey & Pierce, P.L.C.

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