专利名称：Gas panel
发明人：Eric J. Redemann,Kim N. Vu申请号：US09732435申请日：20001207
公开号：US20010013371A1公开日：20010816
摘要：A gas panel for use with a tool for manufacturing a semiconductor includes aone-piece manifold body having an inlet for receiving a process gas. The manifold bodyhas at least one lateral wall extending in the general direction of gas flow. The lateralwall includes at least one active device site having an active device thereon. The activedevice is in gas communication with a gas carrying path formed within the one-piecemanifold. The active device may be a manual valve, a pneumatic valve, a pressureregulator, a pressure transducer, a purifier, a filter or a flow controller. The gas isreceived from the active device at a continuation of the gas flow path in the manifoldbody and is conveyed to a manifold outlet for ultimate to the tool.
申请人：REDEMANN ERIC J.,VU KIM N.
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