Microwave plasmatron

专利名称：Microwave plasmatron

发明人：ROTH, SILVIA, DIPL.-PHYS.,WEBER,

THOMAS,HAMMER, KLAUS, DR. SC. TECHN.

申请号：EP91104340.4申请日：19910320公开号：EP0448077A2公开日：19910925

专利附图：

摘要：The invention relates to a microwave plasmatron for generating a microwaveplasma. A microwave plasmatron is used in the chemically reactive etching of substratesurfaces for microelectronics and micromechanics, in plasma-active coating and as a

plasma generator in ion sources. The solution according to the invention is that one ormore hollow-cylindrical magnets are arranged on a flat surface waveguide, whichmagnets are surrounded by a jacket, of U-shaped construction, consisting offerromagnetic material in such a manner that the open side rests on the surfacewaveguide.

申请人：ROTH & RAUH OBERFLAECHENTECHNIK GMBH

地址：AM HANG 23A; O-9274 WUESTENBRAND,Strasse der Einheit 21 D-09358Wüstenbrand DE

国籍：DE

代理机构：Erich, Dieter

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