专利名称:Microwave plasmatron
发明人:ROTH, SILVIA, DIPL.-PHYS.,WEBER,
THOMAS,HAMMER, KLAUS, DR. SC. TECHN.
申请号:EP91104340.4申请日:19910320公开号:EP0448077A2公开日:19910925
专利附图:
摘要:The invention relates to a microwave plasmatron for generating a microwaveplasma. A microwave plasmatron is used in the chemically reactive etching of substratesurfaces for microelectronics and micromechanics, in plasma-active coating and as a
plasma generator in ion sources. The solution according to the invention is that one ormore hollow-cylindrical magnets are arranged on a flat surface waveguide, whichmagnets are surrounded by a jacket, of U-shaped construction, consisting offerromagnetic material in such a manner that the open side rests on the surfacewaveguide.
申请人:ROTH & RAUH OBERFLAECHENTECHNIK GMBH
地址:AM HANG 23A; O-9274 WUESTENBRAND,Strasse der Einheit 21 D-09358Wüstenbrand DE
国籍:DE
代理机构:Erich, Dieter
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