专利名称：Method and apparatus for observing a
specimen
发明人：Atsushi Miyamoto,Maki Tanaka,Hidetoshi
Morokuma
申请号：US11651031申请日：20070109公开号：US07365325B2公开日：20080429
专利附图：
摘要：A method and device for observing a specimen in which an electron beam isirradiated and scanned from an oblique direction, onto a surface of a calibration
substrate on which a pattern with a known shape is formed, and an SEM image of thesurface of the calibration substrate is obtained. An angle in an oblique direction of theelectron beam irradiated is obtained and is adjusted to a desired angle. The electronbeam is irradiated from the adjusted desired angle in the oblique direction, onto aspecimen substrate on which a pattern is formed, and an SEM image of the specimensubstrate is obtained. The SEM image of the specimen substrate is processed by use ofthe information of the desired angle, and a 3D image of the pattern on the specimensubstrate or a shape of a cross section of the pattern is obtained.
申请人：Atsushi Miyamoto,Maki Tanaka,Hidetoshi Morokuma
地址：Yokohama JP,Yokohama JP,Hitachinaka JP
国籍：JP,JP,JP
代理机构：Antonelli, Terry, Stout & Kraus, LLP.
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