专利名称:3D optoelectronic micro system发明人:Tetsuzo Yoshimura,Yukihiko Arai申请号:US10485573申请日:20020725公开号:US07387913B2公开日:20080617
专利附图:
摘要:A 3D micro optical switching system (3D-MOSS) is fabricated by dividing anoptical switching system into several blocks, creating optoelectronic layers where opticalswitches or tunable filters in each block are disposed, laminating the optoelectroniclayers by connecting the layers with optical connections. The fabrication process includes
a first step of selectively exposing an adhesive bond whose adhesive strength changes byexposure, a second step of contacting the selectively-exposed adhesive bond with a thin-film device array on a first substrate, and a third step of selectively ring part of thin-filmdevices in the thin-film device array from the first substrate onto the selectively-exposedadhesive bond in accordance with an exposure pattern.
申请人:Tetsuzo Yoshimura,Yukihiko Arai
地址:Machida JP,Hachioji JP
国籍:JP,JP
代理机构:Oliff & Berridge, PLC
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